Metrology, inspection, and process control for microlithography XXIII (23-26 February 2009, San Jose, California, United States)Allgair, John Alexander; Raymond, Christopher J.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 2 vol, 2, isbn 978-0-8194-7525-1 0-8194-7525-4Conference Proceedings

Metrology, inspection, and process control for microlithography XXII (25-28 February 2008, San Jose, California, USA)Allgair, John Alexander; Raymond, Christopher J.Proceedings of SPIE, the International Society for Optical Engineering. 2008, issn 0277-786X, isbn 978-0-8194-7107-9, 2 v, isbn 978-0-8194-7107-9Conference Proceedings

Instrumentation, metrology, and standards for nanomanufacturing IV (2-4 August 2010, San Diego, California, United States)Postek, Michael T; Allgair, John Alexander.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7767, issn 0277-786X, isbn 978-0-8194-8263-1, 1Vol, various pagings, isbn 978-0-8194-8263-1Conference Proceedings

Instrumentation, metrology, and standards for nanomanufacturing II (10 August 2008, San Diego, California, USA)Postek, Michael T; Allgair, John Alexander.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7042, issn 0277-786X, isbn 978-0-8194-7262-5 0-8194-7262-X, 1Vol, various pagings, isbn 978-0-8194-7262-5 0-8194-7262-XConference Proceedings

3D Semiconductor Grooves Measurement Simulations (Scatterometry) using Nonstandard FDTD MethodsSHIRASAKI, Hirokimi.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69223T.1-69223T.9, issn 0277-786X, isbn 978-0-8194-7107-9Conference Paper

Laser Diagnostics for Flame Synthesis of Nanostructured Materials : Instrumentation, Metrology, and Process ControlXIAOFEI LIU.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7042, pp 70420G.1-70420G.11, issn 0277-786X, isbn 978-0-8194-7262-5 0-8194-7262-X, 1VolConference Paper

Image library approach to evaluating parametric uncertainty in metrology of isolated feature widthPOTZICK, James.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 727218.1-727218.8, 2Conference Paper

Empirical data validation for model buildingKAZARIAN, Aram.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69221I.1-69221I.6, issn 0277-786X, isbn 978-0-8194-7107-9Conference Paper

Instrumentation, metrology, and standards for nanomanufacturing III (3-5 August 2009, San Diego, California, United States)Postek, Michael T; Allgair, John Alexander.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7405, issn 0277-786X, isbn 978-0-8194-7695-1 0-8194-7695-1, 1Vol, various pagings, isbn 978-0-8194-7695-1 0-8194-7695-1Conference Proceedings

Revivals of Molecular Nonlinear Optics in Physics, Chemistry and Life SciencesZYSS, Joseph.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7042, pp 704002.1-704002.15, issn 0277-786X, isbn 978-0-8194-7262-5 0-8194-7262-X, 1VolConference Paper

A new illumination technique for grating-based nanometer measurement applicationsLI JIANG.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 72723U.1-72723U.9, 2Conference Paper

Measurement of oxide barrier-film thickness of Al alloy by electrochemical impedance spectroscopy at the nanometre scaleHABIB, K.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7042, pp 70420E.1-70420E.15, issn 0277-786X, isbn 978-0-8194-7262-5 0-8194-7262-X, 1VolConference Paper

Readjusting image sharpness by numerical parametric lenses in Forbes-representation and Halton sampling for selective refocusing in digital holographic microscopySTUERWALD, S; SCHMITT, R.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7767, issn 0277-786X, isbn 978-0-8194-8263-1, 1Vol, 77670K.1-77670K.10Conference Paper

An Investigation of Perfluoroalkylamine Contamination ControlDALLAS, Andrew J; ZASTERA, Dustin.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 727220.1-727220.9, 2Conference Paper

CD bias reduction in CD-SEM line width measurement for 32nm node and beyond by using model-based library methodSHISHIDO, Chie; TANAKA, Maki; OSAKI, Mayuka et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 72722C.1-72722C.10, 2Conference Paper

Focus and dose control for high-volume manufacturing of semiconductorSENTOKU, Koichi; EBIHARA, Takeaki; INA, Hideki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 727238.1-727238.7, 2Conference Paper

High-performance, multi-channel, fiber-based absolute distance measuring interferometer systemDECK, Leslie L.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7405, issn 0277-786X, isbn 978-0-8194-7695-1 0-8194-7695-1, 1Vol, 74050E.1-74050E.9Conference Paper

Interferometric imaging ellipsometry: fundamental studySATO, Seichi; ANDO, Shigeru.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7405, issn 0277-786X, isbn 978-0-8194-7695-1 0-8194-7695-1, 1Vol, 74050F.1-74050F.9Conference Paper

Sub-50-nm pitch size grating reference for CD-SEM magnification calibrationNAKAYAMA, Yoshinori; YAMAMOTO, Jiro; KAWADA, Hiroki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 727224.1-727224.11, 2Conference Paper

Automated CD-SEM Metrology for Efficient TD and HVMSTARIKOV, Alexander; MULAPUDI, Satya P.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69221V.1-69221V.12, issn 0277-786X, isbn 978-0-8194-7107-9Conference Paper

High throughput wafer defect monitor for integrated metrology applications in photolithographyRAO, Nagaraja; KINNEY, Patrick; GUPTA, Anand et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69223B.1-69223B.12, issn 0277-786X, isbn 978-0-8194-7107-9Conference Paper

High-speed AFM probe with micromachined membrane tipKIM, Byungki; BYUNG HYUNG KWAK; JAMIL, Faize et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7042, pp 704204.1-704204.8, issn 0277-786X, isbn 978-0-8194-7262-5 0-8194-7262-X, 1VolConference Paper

Implementation of spectroscopic critical dimension (SCD) for leveling inline monitor of ASML 193nm scannerLIN, W. K; YEH, Mike.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69223S.1-69223S.9, issn 0277-786X, isbn 978-0-8194-7107-9Conference Paper

The Potentials of Helium Ion Microscopy for Semiconductor Process MetrologyPOSTEK, Michael T; VLADAR, Andras E.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69220B.1-69220B.7, issn 0277-786X, isbn 978-0-8194-7107-9Conference Paper

CD-SEM Parameter Influence on Image Resolution and Measurement AccuracyBUNDAY, Benjamin; KRAMER, Uwe.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 727204.1-727204.12, 2Conference Paper